Flash buddies Intel
and Micron have today announced a significant breakthrough in terms of
NAND density, the first 128 Gb (16 GB) MLC NAND memory chip.
Manufactured on 20 nm process technology, this 128 Gb chip complies with
the ONFI 3.0 specification (enabling speeds of up to 333 megatransfers
per second) and can be used for new, high-capacity solid state drives,
as well as for next-generation tablets, smartphones and other portable
devices.
According to Intel and Micron, this milestone was made possible by the
use of a new, innovative cell structure that 'breaks the scaling
constraints of the standard NAND floating gate cell by integrating the
first Hi-K/metal gate stack on NAND production.'
"It is gratifying to see the continued NAND leadership from the
Intel-Micron joint development with yet more firsts as our manufacturing
teams deliver these high-density, low-cost, compute-quality 20 nm NAND
devices," said Rob Crooke, Intel vice president and general manager of
Intel's Non-Volatile Memory Solutions Group. "Through the utilization of
planar cell structure and Hi-K/Metal gate stack, IMFT continues to
advance the technological capabilities of our NAND flash memory solutions to enable exciting new products, services and form factors."
IM Flash Technologies (the NAND joint venture of Intel and Micron) will
have samples of the 128 Gb MLC chip in January and expects to start mass
production in the first half of next year. In the mean time, the JV has
ramped up mass production of its 64 Gb 20 nm NAND memory.
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